Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method

ABSTRACT

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 μm. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a Divisional application of co-pending applicationSer. No. 15/972,416, filed on May 7, 2018, which claims the benefitunder 35 U.S.C. § 119(a) to Patent Application No. 2017-092330, filed inJapan on May 8, 2017, all of which are hereby expressly incorporated byreference into the present application.

TECHNICAL FIELD

This invention relates to a large-size synthetic quartz glass substrate,an evaluation method, and a manufacturing method.

BACKGROUND ART

With the recent progress in miniaturization of patterns byphotolithography, the demand for high flatness to synthetic quartz glasssubstrates from which masks are formed is increasing. In the prior art,the specification for the flatness of substrates is generally determinedby flatness values over the entire front or back surface of a substrate.However, in the field where masks of larger area are used to comply withlarge-size displays such as flat panel displays, not only the substrateshould have a low flatness on the overall surface, but it is alsoimportant to reduce a variation of flatness within the substratesurface. Patent Document 1 discloses a method for evaluating a variationof flatness within the substrate surface by dividing the substrate intoa plurality of sites and comparing local flatness within each site.

CITATION LIST

-   Patent Document 1: JP-A 2004-200600 (U.S. Pat. No. 7,230,680)

DISCLOSURE OF INVENTION

It is critical that the mask-forming substrate have a high flatness.Even when the flatness on the overall substrate falls within a certainspecification, there is a case wherein the flatness on the overallsubstrate has a variation or unevenness, and the surface includes localareas having a large gradient of undulation. This leads to unevenness ofa thin film deposited on the substrate or a variation of focus uponexposure through the mask. In the method of Patent Document 1, the wafersurface is divided into a plurality of sites and the flatness of eachsite is used in evaluation to cause the shape to approach the desiredshape. Since the sites are not overlapped, but separated, the flatnessbetween the sites such as local undulation gradient flanked with thesites is not evaluated.

An object of the invention is to provide a large-size synthetic quartzglass substrate which has a high flatness and a minimal local gradientin the substrate surface so that it is useful as a starting substrate toform a mask which allows for exposure at a high accuracy; an evaluationmethod; and a manufacturing method.

The inventors have found the following. In a large-size synthetic quartzglass substrate serving as a starting substrate to form a mask, aneffective range is defined on the front and/or back surface. Theeffective range is partitioned into a plurality of evaluation regionssuch that the evaluation regions partly overlap each other. It iseffective to evaluate flatness on the basis of flatness data within eachevaluation region and further data of the difference between flatnesswithin one evaluation region and flatness within another evaluationregion overlapping the one evaluation region. By determining an amountof material removal in polishing on the basis of the evaluation resultand locally polishing the substrate surface in accordance with thedetermined amount, a large-size synthetic quartz glass substrate isobtained which has a high flatness and a minimal local gradient in thesubstrate surface so that it is useful as a starting substrate to form amask which allows for exposure at a high accuracy.

In one aspect, the invention provides a large-size synthetic quartzglass substrate having front and back surfaces and a diagonal length ofat least 1,000 mm, wherein an effective range is defined on the frontand/or back surface, the effective range is partitioned into a pluralityof evaluation regions such that the evaluation regions partly overlapeach other, and a flatness in each evaluation region is up to 3 μm.

In one preferred embodiment, the substrate is rectangular, the effectiverange is a rectangular range defined on the substrate surface byremoving a band extending 10 mm from each side of the substrate surface,the rectangular range having two pairs of opposed sides, the evaluationregion is delineated by one pair of opposed sides of the effective rangeand two straight lines parallel to the other pair of opposed sides andhas a width of 100 to 300 mm along the one pair of opposed sides.

In one preferred embodiment, for each evaluation region, the area of theoverlap between that evaluation region and the closest one ofoverlapping evaluation regions is 50 to 98% of the area of eachevaluation region.

In one preferred embodiment, for each evaluation region, a difference inflatness between that evaluation region and the closest one ofoverlapping evaluation regions is up to 0.8 μm.

In another aspect, the invention provides a method for evaluating theflatness of a large-size synthetic quartz glass substrate having frontand back surfaces and a diagonal length of at least 1,000 mm, wherein aneffective range is defined on one or both of the front and backsurfaces, the method comprising the steps of:

partitioning the effective range into a plurality of evaluation regionssuch that the evaluation regions partly overlap each other, measuring aflatness within each evaluation region, and optionally computing adifference between the flatness in one evaluation region and theflatness in another evaluation region overlapping the one evaluationregion.

In a further aspect, the invention provides a method for manufacturing alarge-size synthetic quartz glass substrate, comprising the steps of:

evaluating the flatness of a large-size quartz glass substrate accordingto the above method,

determining an amount of material removal in polishing on the basis ofthe measured flatness, and

locally polishing the surface of the quartz glass substrate inaccordance with the determined amount of material removal in polishing.

In a still further aspect, the invention provides a method formanufacturing a large-size synthetic quartz glass substrate, comprisingthe steps of:

evaluating the flatness of a large-size quartz glass substrate accordingto the above method,

determining an amount of material removal in polishing on the basis ofthe measured flatness and flatness difference, and

locally polishing the surface of the quartz glass substrate inaccordance with the determined amount of material removal in polishing.

Advantageous Effects of Invention

A large-size synthetic quartz glass substrate which has a high flatnessand a minimal local gradient within the substrate surface is provided.The substrate is used to form a large-size photomask which is used inpanel exposure, enabling exposure of a fine size pattern with improvedcritical dimension (CD) accuracy.

BRIEF DESCRIPTION OF DRAWINGS

The FIGURE schematically illustrates one exemplary partitioning of aneffective range into a plurality of evaluation regions.

DESCRIPTION OF PREFERRED EMBODIMENTS

A large-size synthetic quartz glass substrate which is used as astarting substrate to form a mask is generally prepared by furnishing asynthetic quartz glass block as prepared by the direct or indirectprocess, slicing the glass block to a predetermined thickness by suchmeans as a wire saw, external shape machining to a predetermined size,grinding, lapping, rough polishing, and precision polishing. The quartzglass substrate thus obtained is typically shaped as a rectangular platehaving a diagonal length of at least 1,000 mm and preferably a thicknessof 5 to 30 mm. In this sense, the substrate has front and back surfacesand four sides. Typically the quartz glass substrate has a diagonallength of 3,500 mm at maximum. The quartz glass substrate over itsentire surface has a flatness of preferably up to 30 μm, more preferablyup to 20 μm, and even more preferably up to 10 μm on either of the frontand back surfaces, and also a parallelism of preferably up to 30 μm,more preferably up to 20 μm, and even more preferably up to 10 μmbetween the front and back surfaces.

An effective range is defined on each of the front and back surfaces ofthe substrate. Specifically, the effective range is a range of thesubstrate surface excluding an outer peripheral portion and morespecifically a range defined on the substrate surface by removing a bandextending 10 mm from each side from the substrate surface. In oneembodiment wherein the large-size synthetic quartz glass substrate isrectangular, a rectangular range is defined by removing a band extending10 mm from each side. Notably, the rectangular range has two pairs ofopposed sides.

According to the invention, the effective range on the front and/or backsurface of the quartz glass substrate is partitioned into a plurality ofevaluation regions such that the evaluation regions partly overlap eachother, for example, any of evaluation regions is positioned in theoverall effective range. The way of partitioning evaluation regions isdescribed in conjunction with a rectangular large-size synthetic quartzglass substrate, for example. As shown in the FIGURE, one evaluationregion is delineated by one pair of opposed sides of the effective rangeE on the substrate surface S and two straight lines parallel to theother pair of opposed sides of the effective range E (notably the twostraight lines being inclusive of the other pair of opposed sidesthemselves). In this case, all evaluation regions are rectangular andjuxtaposed in the order of evaluation regions 1, 2, 3, n along one pairof opposed sides. Each evaluation region has a width of at least 100 mm,especially at least 150 mm and up to 300 mm, especially up to 250 mmalong one pair of opposed sides. Preferably the width is identical amongall evaluation regions. That is, evaluation regions are preferablypartitioned at the same pitch. The one pair of opposed sides along whichevaluation regions are juxtaposed may be on either longer side orshorter side of a rectangular substrate, preferably in a directionconvenient to compute polishing amounts or to measure flatness, forexample, moving direction of a polishing tool or axial direction duringflatness measurement.

As the degree of overlap between evaluation regions increases, the totalnumber of evaluation regions increases, which is advantageous in that alarge-size synthetic quartz glass substrate having a high flatness andminimal local gradient within the substrate surface is obtained, butdisadvantageous in that a longer time is necessary for evaluation andprocessing. As the degree of overlap between evaluation regions lowers,the total number of evaluation regions decreases, which is advantageousin that a shorter time is taken for evaluation and processing, butineffective in obtaining a large-size synthetic quartz glass substratehaving a high flatness and minimal local gradient within the substratesurface. Therefore, an adequate degree of overlap is selected inaccordance with the desired flatness and processing time. From thispoint of view, the degree of overlap between evaluation regions ispreferably determined such that for each evaluation region, preferablycommonly for all evaluation regions, the area of the overlap betweenthat evaluation region and the closest one of overlapping evaluationregions is at least 50%, more preferably at least 60%, even morepreferably at least 70% and up to 98%, more preferably up to 90%, evenmore preferably up to 80% of the area of each evaluation region.Reference is now made to one embodiment wherein the effective range is800 mm on one pair of opposed sides (short side) and 900 mm on the otherpair of opposed sides (long side), the evaluation region has a width orpitch of 200 mm along one pair of opposed sides, and for each evaluationregion, the area of the overlap between that evaluation region and theclosest one of overlapping evaluation regions is 50% of the area of eachevaluation region. In this embodiment, the effective range ispartitioned into seven (n=7 in total) evaluation regions 1, 2, 3, - - -, 7 whose center lines (parallel to the other pair of opposed sides) arearranged at intervals of 100 mm along one pair of opposed sides.

With respect to the measurement of flatness and parallelism of theoverall effective range and each evaluation region, measurement may beperformed on the front and/or back surface of the quartz glass substratewhile the quartz glass substrate is held with its surface set vertical(in gravity direction). Flatness may be measured by a commerciallyavailable flatness meter. Parallelism may be measured by a micrometer.Provided that a least square plane computed from a substrate surface (onanalysis) is used as a reference plane, the “flatness” as used herein isthe sum of a maximum of the distance between a raised portion on anactual substrate surface (surface based on measured coordinates) and thereference surface and a maximum of the distance between a recessedportion on an actual substrate surface (surface based on measuredcoordinates) and the reference surface.

According to the invention, there is provided a quartz glass substratehaving a flatness of up to 3 μm, preferably up to 2.5 μm and morepreferably up to 2 μm in each evaluation region, preferably in allevaluation regions. In a preferred embodiment, there is provided aquartz glass substrate in which for each evaluation region, preferablyfor all evaluation regions, a difference in flatness between thatevaluation region and the closest one of overlapping evaluation regionsis up to 0.8 μm, especially up to 0.5 μm.

According to the invention, once the evaluation regions are partitionedas defined above, a large-size synthetic quartz glass substrate may beevaluated for flatness. Specifically, the invention provides a methodfor evaluating the flatness of a large-size synthetic quartz glasssubstrate having a diagonal length of at least 1,000 mm, wherein aneffective range is defined on the front and/or back surface, the methodcomprising the steps of partitioning the effective range, preferably theentire effective range into a plurality of evaluation regions such thatthe evaluation regions partly overlap each other, measuring a flatnesswithin each evaluation region, and optionally computing a differencebetween the flatness of one evaluation region and the flatness of anevaluation region overlapping the one evaluation region.

By evaluating the flatness of a large-size quartz glass substrateaccording to the above evaluation method, determining an amount ofmaterial removal in polishing on the basis of the measured flatness andoptionally the computed flatness difference, and locally polishing thefront or back surface of the quartz glass substrate in accordance withthe determined amount of material removal in polishing, a large-sizesynthetic quartz glass substrate having a high flatness and a minimallocal gradient within the substrate surface may be manufactured,typically a large-size synthetic quartz glass substrate in which aflatness in each evaluation region is up to 3 μm, preferably up to 2.5μm, and more preferably up to 2 μm, and a difference in flatness betweenthat evaluation region and the closest one of overlapping evaluationregions is up to 0.8 μm, preferably up to 0.5 μm may be manufactured.

The procedure of determining an amount of material removal in polishingfrom the measurement result of flatness, i.e., on the basis of themeasured flatness of each evaluation region may be as follows. Theprocedure deals with each of partitioned evaluation regions. If theflatness of a 1-st evaluation region exceeds the target flatness, forexample, in excess of 3 μm, an amount of material removal in polishingnecessary to polish and remove any raised portion within that evaluationregion so that the flatness may become the target flatness or less, forexample, 2.5 μm or less, is determined. If the flatness of a 1-stevaluation region is equal to or less than the target flatness, forexample, equal to or less than 3 μm, the amount of material removal inpolishing is set zero (0), and the procedure transfers to a 2-ndevaluation region. For each of 2-nd and subsequent evaluation regions,the amount of material removal in polishing is determined as done forthe 1-st region. By repeating the step of determining an amount ofmaterial removal in polishing in each evaluation region, the amounts ofmaterial removal in polishing are determined for all evaluation regions.For the overlap between two evaluation regions, an average of theamounts of material removal in polishing in the overlapping evaluationregions is calculated as the amount of material removal in polishing forthe overlap. In this way, the amounts of material removal in polishingare collected for all evaluation regions.

Further, an additional amount of material removal in polishing may bedetermined on the basis of a difference in flatness between evaluationregions. In one embodiment, the additional amount of material removal inpolishing is determined from the measured value of flatness. In anotherembodiment, the shape of substrate surface after polishing in the amountof material removal in polishing which is determined on the basis of theflatness of each evaluation region is simulated, and a differencebetween the flatness within the evaluation region resulting from thesimulation and the flatness within the other evaluation regionoverlapping that evaluation region is calculated.

In the other embodiment, the procedure deals with each of partitionedevaluation regions. The difference between the flatness within a 1-stevaluation region and the flatness within the other evaluation regionoverlapping the 1-st evaluation region is computed. If this differenceexceeds the target difference, for example, in excess of 0.5 μm, anadditional amount of material removal in polishing necessary to polishand remove any raised portion within these two evaluation regions sothat the difference may become the target difference is determined. Ifthis difference is equal to or less than the target difference, forexample, equal to or less than 0.5 μm, the additional amount of materialremoval in polishing is set zero (0), and the procedure transfers to a2-nd evaluation region. For each of 2-nd and subsequent evaluationregions, the amount of material removal in polishing is determined asdone for the 1-st region. By repeating the step of determining anadditional amount of material removal in polishing in each evaluationregion, the additional amounts of material removal in polishing aredetermined for all evaluation regions. In this way, the additionalamounts of material removal in polishing are collected for allevaluation regions. If necessary, the additional amounts of materialremoval in polishing are added to the above-mentioned amounts ofmaterial removal in polishing determined on the basis of flatness ofeach evaluation region.

The procedure of locally polishing the quartz glass substrate inaccordance with the determined amounts of material removal in polishingmay be carried out using, for example, an apparatus comprising a platenfor holding a large-size synthetic quartz glass substrate with itssurface kept horizontal, and a polishing tool adapted to move on thequartz glass substrate to carry out local polishing. The quartz glasssubstrate is locally polished by changing the moving speed of thepolishing tool on the substrate in accordance with the necessary amountsof material removal in polishing. The polishing tool includes, forexample, a rotating shaft, a disk-shaped polishing plate, and amechanism for pressing the polishing plate against the substrate.Specifically, an abrasive pad such as abrasive cloth is attached to thepolishing plate, if necessary via an elastomer such as rubber sheet. Theabrasive pad is brought in contact with the substrate while a slurry issupplied thereto. The polishing plate is preferably made of a metalmaterial selected from among stainless steel (SUS), aluminum alloys,titanium, and brass. The polishing plate preferably has a diameter of atleast 100 mm, more preferably at least 300 mm and up to 800 mm, morepreferably up to 600 mm. During the polishing step, the polishing platemay be changed among those of different size in accordance with thetarget amount of material removal in polishing. For example, on aportion having a large difference between the flatness within anevaluation region and the flatness within another overlapping evaluationregion, the polishing tool is changed to a tool of smaller size in orderto enable precision control of polishing and removal, because of agreater gradient of undulation in a relatively narrow range.

The abrasive cloth may be selected from non-woven fabric, suede andexpanded polyurethane, and fixedly secured to the polishing plate by anadhesive. The adhesive used herein is not particularly limited as longas it provides a sufficient bond strength to prevent separation of theabrasive cloth from the polishing plate or elastomer during polishingoperation. Suitable adhesives include acrylic, epoxy and urethane baseadhesives. The slurry may be abrasive grains such as silicon carbide,alumina, cerium oxide and colloidal silica dispersed in water.

After the local polishing step, the quartz glass substrate may beevaluated for flatness again. If it is confirmed as a result of thisevaluation that the target flatness or the target flatness difference isnot reached, an amount of material removal in polishing is determinedagain on the basis of this evaluation result, and local polishing stepis carried out again. The flatness evaluation and local polishing stepsmay be repeated until the target flatness and further the targetflatness difference are finally reached.

EXAMPLE

Examples of the invention are given below by way of illustration and notby way of limitation.

Example 1

A synthetic quartz glass substrate stock was lapped (or roughlypolished) and precision polished on its front and back surfaces,furnishing a starting synthetic quartz glass substrate. The startingsubstrate was dimensioned 1,600 mm×1,800 mm×17.2 mm (thick) and had aflatness of 20 μm on the overall front surface, a flatness of 22 μm onthe overall back surface, and a parallelism of 15 μm on the overallsubstrate. The flatness was measured by a flatness tester (KurodaPrecision Industries Ltd.), and the parallelism was measured by amicrometer (Mitsutoyo Corp.), the same hereinafter.

From the measured data of flatness and parallelism of the startingsubstrate, amounts of material removal in polishing necessary to achievea flatness within 10 μm on each of overall front and back surfaces and aparallelism within 10 μm were determined. Thereafter, using an apparatusfor carrying out local polishing by moving a polishing tool across thestarting substrate whose surfaces were kept horizontal, polishingoperation was carried out while changing the moving speed of the tool onthe substrate in accordance with the determined amounts of materialremoval in polishing. There was obtained an intermediate substratehaving a thickness of 17.0 mm, a flatness of 9 μm on the overall frontsurface, a flatness of 12 μm on the overall back surface, and aparallelism of 10 μm on the overall substrate.

An effective range was defined on the front and back surfaces byremoving a band extending 10 mm from each side of the front or backsurface. The effective range having a long side of 1,780 mm and a shortside of 1,580 mm was partitioned into a plurality of evaluation regionshaving two pairs of opposed sides. Specifically, each evaluation regionwas delineated by one pair of opposed sides of the effective range on1,780 mm long side and two straight lines parallel to the other pair ofopposed sides of the effective range on 1,580 mm short side and had awidth of 280 mm along the one pair of opposed sides on the long side.Center lines parallel to the other pair of opposed sides of eachevaluation region on the short side were arranged in order at intervalsof 10 mm along the one pair of opposed sides on the long side. In thisway, 151 (in total per surface) evaluation regions were partitioned. Thearea of the overlap between a certain evaluation region and the closestone of overlapping evaluation regions was 96% of the area of eachevaluation region.

Next, a flatness in each evaluation region was measured. For eachevaluation region, a difference in flatness between that evaluationregion and the closest one of overlapping evaluation regions (simplyreferred to as “flatness difference,” hereinafter) was computed. For thepurpose of obtaining a quartz glass substrate having a flatness in eachevaluation region of up to 3 μm and a flatness difference of up to 0.5μm, the results of measurement were evaluated, finding that 15evaluation regions had a flatness in evaluation region in excess of 3 μmand 7 evaluation regions had a flatness difference in excess of 0.5 μm.

Next, an amount of material removal in polishing necessary to reduce theflatness in each evaluation region to or below 3 μm was computed. First,on the basis of the measurement data of flatness in each evaluationregion, for every evaluation region, a most depressed position (orlowest point) within that evaluation region was used as the reference, aportion which was raised beyond the reference by at least 2.5 μm wasregarded as a portion to be polished, and a necessary amount of materialremoval in polishing was determined. Then the amounts of materialremoval in polishing for each evaluation region were collected,determining the amounts of material removal in polishing on the overallsubstrate. For the overlap between two evaluation regions, an average ofthe amounts of material removal in polishing in the overlappingevaluation regions was calculated as the amount of material removal inpolishing for the overlap.

Next, an additional amount of material removal in polishing necessary toreduce the flatness difference to or below 0.5 μm was computed. First,on the basis of the measurement data of flatness difference, forevaluation regions having a flatness difference in excess of 0.5 μm, amost depressed position (or lowest point) within these evaluationregions was used as the reference, a portion which was raised beyond thereference by at least 0.4 μm was regarded as a portion to be polished,and a necessary amount of material removal in polishing was determined.Then the additional amounts of material removal in polishing for eachevaluation region were collected, determining the additional amounts ofmaterial removal in polishing on the overall substrate.

Next, on the basis of the amount of material removal in polishingdetermined from the flatness within each evaluation region and theadditional amount of material removal in polishing determined from theflatness difference, a polishing apparatus for carrying out localpolishing by moving the polishing tool having a disk-shaped polishingplate across the substrate was used to carry out local polishing on thefront or back surface of the intermediate substrate. Notably, in theevaluation region to which the additional amount of material removal inpolishing as determined from the flatness difference is applied, apolishing plate of diameter 200 mm was used in polishing in order toenable precision control of the amount and range of polishing, becauseof a greater gradient of undulation in a relatively narrow range; and inthe remaining evaluation regions, a polishing plate of diameter 400 mmwas used.

As a result, there was obtained a large-size synthetic quartz glasssubstrate having a flatness of 8 μm on the overall front surface, aflatness of 10 μm on the overall back surface, a parallelism of 9 μm onthe overall substrate, a flatness within evaluation region of 2.3 μm atmaximum, and a flatness difference of 0.4 μm at maximum.

Example 2

A synthetic quartz glass substrate stock was lapped (or roughlypolished) and precision polished on its front and back surfaces,furnishing a starting synthetic quartz glass substrate. The startingsubstrate was dimensioned 800 mm×900 mm×13.2 mm (thick) and had aflatness of 15 μm on the overall front surface, a flatness of 17 μm onthe overall back surface, and a parallelism of 12 μm on the overallsubstrate.

From the measured data of flatness and parallelism of the startingsubstrate, amounts of material removal in polishing necessary to achievea flatness within 10 μm on each of overall front and back surfaces and aparallelism within 10 μm were determined. Thereafter, using an apparatusfor carrying out local polishing by moving a polishing tool across thestarting substrate whose surfaces were kept horizontal, polishingoperation was carried out while changing the moving speed of the tool onthe substrate in accordance with the determined amounts of materialremoval in polishing. There was obtained an intermediate substratehaving a thickness of 13.0 mm, a flatness of 9 μm on the overall frontsurface, a flatness of 10 μm on the overall back surface, and aparallelism of 9 μm on the overall substrate.

An effective range was defined on the front and back surfaces byremoving a band extending 10 mm from each side of the front or backsurface. The effective range having a long side of 880 mm and a shortside of 780 mm was partitioned into a plurality of evaluation regionshaving two pairs of opposed sides. Specifically, each evaluation regionwas delineated by one pair of opposed sides of the effective range on880 mm long side and two straight lines parallel to the other pair ofopposed sides of the effective range on 780 mm short side and had awidth of 280 mm along the one pair of opposed sides on the long side.Center lines parallel to the other pair of opposed sides of eachevaluation region on the short side were arranged in order at intervalsof 50 mm along the one pair of opposed sides on the long side. In thisway, 13 (in total per surface) evaluation regions were partitioned. Thearea of the overlap between a certain evaluation region and the closestone of overlapping evaluation regions was 82% of the area of eachevaluation region. Next, a flatness in each evaluation region wasmeasured. For each evaluation region, a difference in flatness betweenthat evaluation region and the closest one of overlapping evaluationregions (flatness difference) was computed. For the purpose of obtaininga quartz glass substrate having a flatness in each evaluation region ofup to 3 μm and a flatness difference of up to 0.5 μm, the results ofmeasurement were evaluated, finding that 2 evaluation regions had aflatness in evaluation region in excess of 3 μm and no evaluationregions had a flatness difference in excess of 0.5 μm.

Next, an amount of material removal in polishing necessary to reduce theflatness in each evaluation region to or below 3 μm was computed. First,on the basis of the measurement data of flatness in each evaluationregion, for every evaluation region, a most depressed position (orlowest point) within that evaluation region was used as the reference, aportion which was raised beyond the reference by at least 2.5 μm wasregarded as a portion to be polished, and a necessary amount of materialremoval in polishing was determined. Then the amounts of materialremoval in polishing for each evaluation region were collected,determining the amounts of material removal in polishing on the overallsubstrate. For the overlap between two evaluation regions, an average ofthe amounts of material removal in polishing in the overlappingevaluation regions was calculated as the amount of material removal inpolishing for the overlap.

Next, on the basis of the amount of material removal in polishingdetermined from the flatness within each evaluation region, a polishingtool having a disk-shaped polishing plate of diameter 300 mm was used tocarry out local polishing on the front or back surface of theintermediate substrate.

As a result, there was obtained a large-size synthetic quartz glasssubstrate having a flatness of 7 μm on the overall front surface, aflatness of 8 μm on the overall back surface, a parallelism of 9 μm onthe overall substrate, a flatness within evaluation region of 2.8 μm atmaximum, and a flatness difference of 0.4 μm at maximum.

Japanese Patent Application No. 2017-092330 is incorporated herein byreference. Although some preferred embodiments have been described, manymodifications and variations may be made thereto in light of the aboveteachings. It is therefore to be understood that the invention may bepracticed otherwise than as specifically described without departingfrom the scope of the appended claims.

1. A large-size synthetic quartz glass substrate having front and backsurfaces and a diagonal length of at least 1,000 mm, and having athickness of 5 to 30 mm, wherein an effective range is defined on thefront and/or back surface, the effective range is partitioned into aplurality of evaluation regions such that the evaluation regions partlyoverlap each other, and a flatness in each evaluation region is up to 3μm.
 2. The quartz glass substrate of claim 1 wherein the substrate isrectangular, the effective range is a rectangular range defined on thesubstrate surface by removing a band extending 10 mm from each side ofthe substrate surface, the rectangular range having two pairs of opposedsides, the evaluation region is delineated by one pair of opposed sidesof the effective range and two straight lines parallel to the other pairof opposed sides and has a width of 100 to 300 mm along the one pair ofopposed sides.
 3. The quartz glass substrate of claim 1 wherein for eachevaluation region, the area of the overlap between that evaluationregion and the closest one of overlapping evaluation regions is 50 to98% of the area of each evaluation region.
 4. The quartz glass substrateof claim 1 wherein for each evaluation region, a difference in flatnessbetween that evaluation region and the closest one of overlappingevaluation regions is up to 0.8 μm.